Table of contents - Growth And Study Of Magnetostrictive FeSiBC Thin Films For Device Applications

Email:Mannan.Ali@physics.org	Table of Contents
Web: http://members.xoom.com/MannansZone/thesis.html

Table of Contents

1.0 Introduction	1

2.0 Magneto Optic Kerr Effect (MOKE)	3

	2.1 Introduction	3
	2.2 Principles of MOKE	4
	2.3 MOKE Magnetometer	9
	2.4 MOKE Imaging	22
	2.5 Interpretation of the Kerr images	26
	2.6 Magnetic measurements through transparent substrates	29
	2.7 Conclusions	30
	2.8 References	31

3.0 General Experimental Techniques	32

	3.1 Thin Film Deposition	32

	3.1.1 The sputtering process	32
	3.1.2 Radio Frequency Magnetron Sputtering	33
	3.1.3 Target and Substrate preparation	35
	3.1.4 The deposition procedure	37
	3.1.5 Calibration of deposition rate	38

	3.2 Inductive magnetometer (MH)	40
	3.3 Heat Treatments	42
	3.4 X-Ray Diffraction	44
	3.5 Magneto Impedance (MI)	45
	3.6 Patterning by photolithography	47
	3.7 References	48

4.0 Thin Film Deposition	49

	4.1 Introduction	49
	4.2 Parameters which effect sputter deposited films	50

	4.2.1 Pressure	51
	4.2.2 Target-substrate separation	53
	4.2.3 Sputtering Power	54
	4.2.4 Substrate temperature	54
	4.2.5 Nature of substrate	55
	4.2.6 Target Composition	56
	4.2.7 Substrate Biasing	56

	4.3 Magnetic properties of thin films	56

	Growth and study of magnetostrictive FeSiBC thin films, for device applications, Mannan Ali (1999)
	(Online Copy)

	4.4 Results and discussions	60

	4.4.1 General findings	60
	4.4.2 Substrate mounting	61
	4.4.3 The effects of pressure	61
	4.4.4 Substrate sputter-clean	64
	4.4.5 The effects of contamination	65
	4.4.6 Substrate biasing	67
	4.4.7 Influence of substrate type	68
	4.4.8 Thickness dependence	72
	4.4.9 X-ray diffraction	73

	4.5 Conclusions	74
	4.6 References	75

5.0 Magnetic Anisotropy In Amorphous Films	79

	5.1 Introduction	79
	5.2 Magnetocrystalline Anisotropy	80
	5.3 Shape Anisotropy	82
	5.4 Magnetostriction and Magnetoelasticity	84
	5.5 Magnetic Anisotropy Induced During The Deposition	87

	5.5.1 Growth Induced	87
	5.5.2 Stress Induced	88
	5.5.3 Field Induced	89

	5.6 Post-Induced Magnetic Anisotropy	90

	5.6.1 Magnetic Annealing	90
	5.6.2 Stress Annealing	91
	5.6.3 Annealing	92

	5.7 Domains in thin films	92
	5.8 Results and discussions

	5.8.1 Radial Magnetic anisotropy of the as-deposited films	96
	5.8.2 Magnetic Annealing	108
	5.8.3 Magnetostriction and Magneotelasticity	109

	5.8.3.1 Application of stress	110
	5.8.3.2 Strained growth	114
	5.8.3.3 Stress annealing	116
	5.8.3.4 Strain during measurement	118

	5.9 Photolithographically patterned films	121

	5.10 Conclusions	123
	5.11 References	125

	Growth and study of magnetostrictive FeSiBC thin films, for device applications, Mannan Ali (1999)
	(Online Copy)

6.0 Magneto Impedance investigation	130

	6.1 Introduction	130
	6.2 Magneto Impedance	131

	6.2.1 Low frequency limit	132
	6.2.2 High Frequency limit (<100MHz)	133

	6.3 Domain structure and magnetostriction	134
	6.4 Sample preparation	136
	6.5 Results and Discussions	137

	6.5.1 Ribbon samples	137
	6.5.2 Thin Film Samples	143

	6.5.2.1 FeSiBC amorphous ferromagnetic films	143
	6.5.2.2 CoFeB amorphous ferromagnetic films	151
	6.5.2.3 Layered FeSiBC amorphous ferromagnetic films with copper	153

	6.6 Domain rotational model for the effective transverse susceptibility	159
	6.7 Conclusions	164
	6.8 Appendix	165
	6.9 References	168

7.0 Conclusions and Future work	170

8.0 Access To Thesis (Copyright Notice)	174

9.0 Online Version	175

10.0 Glossary	176

	Growth and study of magnetostrictive FeSiBC thin films, for device applications, Mannan Ali (1999)
	(Online Copy)